期刊
APPLIED PHYSICS LETTERS
卷 96, 期 7, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3293295
关键词
discharges (electric); plasma density; plasma instability; plasma temperature
资金
- Ministry of Education, Science and Technology [2009-0082624]
- Seoul Science Scholarship
- National Research Foundation of Korea [2009-0082624] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Remarkable changes of the electron temperature and the plasma density by increasing bias power were observed in low gas pressure inductively coupled plasma (ICP) by the measurement of electron energy distribution function (EEDF). As the bias power increases, the electron temperature increased with accompanying the evolution of the EEDF from a bi-Maxwellian to a Maxwellian distribution. However, a different trend of the plasma density was observed with a dependence on the ICP powers. When the ICP power was relatively small or the discharge is in capacitive mode (E mode), the plasma density increased considerably with the bias power, while decrease of the plasma density was observed when the discharge is in inductive mode (H mode). The change of the plasma density can be explained by the balance between total power absorption and power dissipation.
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