期刊
APPLIED PHYSICS LETTERS
卷 97, 期 4, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3473772
关键词
free energy; hafnium compounds; MOS capacitors; silicon; silicon compounds; titanium compounds; vacancies (crystal)
资金
- National Science Council of the Republic of China, Taiwan
Oxygen vacancies are electronic defects in materials. In a metal oxide system, the distribution of such vacancies is determined by the oxygen affinity. This study predicts the oxygen vacancy concentration in a high-k/metal gate system using a developed thermal dynamic model. A system with Ti:N=2 has a 200 mV lower flat band voltage than an N rich metal. The Gibbs free energy of formation of oxygen vacancies, similar to 0.5 eV, is derived from flab band voltage shifts and created neutral oxygen vacancy. The oxygen vacancy model based on estimating thermal dynamics is proposed. (C) 2010 American Institute of Physics. [doi:10.1063/1.3473772]
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