期刊
APPLIED PHYSICS LETTERS
卷 85, 期 21, 页码 5037-5039出版社
AMER INST PHYSICS
DOI: 10.1063/1.1825623
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We demonstrate the fabrication of a three-dimensional woodpile photonic crystal in the near-infrared using a layer-by-layer approach involving electron beam lithography and spin on glass planarization. The alignment accuracy between the first and the fifth layer is within 10% of the lattice spacing as measured from cross section scanning-electron-microscopy images. Optical reflectivity measurements reveal peaks consistent with the photonic gap frequency. The method offers a way of rapid prototyping full three-dimensional photonic band gap devices with considerable flexibility of materials choice. Moreover, lattice structure that can operate at wavelengths into the visible can be fabricated using this approach. (C) 2004 American Institute Of Physics.
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