期刊
APPLIED PHYSICS LETTERS
卷 97, 期 14, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3494595
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资金
- National Science Foundation [10721404]
- Ministry of Science and Technology of China [2009CB929400]
- Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering [DE-AC02-76SF00515]
Atomically flat thin films of topological insulator Bi2Se3 have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi2Se3 films. The as-grown films without doping exhibit a low defect density of 1.0 +/- 0.2X10(11)/cm(2), and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement. (C) 2010 American Institute of Physics. [doi:10.1063/1.3494595]
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