期刊
APPLIED PHYSICS LETTERS
卷 94, 期 8, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3089820
关键词
interface phenomena; ultrasonic cleaning
资金
- Samsung Electronics
- KRF [KRF-2007-412-J03001]
- SNU Engineering Research Institute.
- National Research Foundation of Korea [2007-412-J03001] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
We elucidate the major mechanism of microparticle removal in the megasonic cleaning process through the direct visualization experiments. It is revealed that particles sitting on solids are removed by adjacent microbubbles that oscillate near the substrates and exert interfacial and pressure gradient forces on the particles. Other pressure and streaming effects are shown to be too weak to detach the particles.
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