4.6 Article

DyScO3 buffer layer for a performing metal-ferroelectric-insulator-semiconductor structure with multiferroic BiFeO3 thin film

期刊

APPLIED PHYSICS LETTERS
卷 94, 期 14, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3116088

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bismuth compounds; buffer layers; dielectric thin films; dysprosium compounds; MFIS structures; multiferroics; random-access storage

资金

  1. DOD [W911NF-05-1-0340, W911NF-06-1-0030, W911NF-06-1-0183]

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Metal-ferroelectric-insulator-semiconductor structures with a BiFeO3 ferroelectric layer and DyScO3 insulating buffer layer were fabricated and characterized. BiFeO3 film was polycrystalline with rhombohedral structure and DyScO3 film was amorphous. The size of the capacitance-voltage memory window (Delta V-FB) was investigated as a function of voltage sweep and frequency; Delta V-FB increased to a saturation value of 1.7 V with the sweep voltage and it almost remained constant over a frequency range of 1 kHz to 1 MHz.

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