相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Band bending measurement of HfO2/SiO2/Si capacitor with ultra-thin La2O3 insertion by XPS
K. Kakushima et al.
APPLIED SURFACE SCIENCE (2008)
Overview and status of metal S/D Schottky-barrier MOSFET technology
JM Larson et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2006)
New route to zero-barrier metal source/drain MOSFETs
D Connelly et al.
IEEE TRANSACTIONS ON NANOTECHNOLOGY (2004)
Recent advances in Schottky barrier concepts
RT Tung
MATERIALS SCIENCE & ENGINEERING R-REPORTS (2001)
分享论文
