4.6 Article

Low-temperature field-effect and magnetotransport properties in a ZnO based heterostructure with atomic-layer-deposited gate dielectric

期刊

APPLIED PHYSICS LETTERS
卷 93, 期 24, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3035844

关键词

aluminium compounds; dielectric materials; electron density; Hall mobility; II-VI semiconductors; magnesium compounds; metal-insulator transition; molecular beam epitaxial growth; semiconductor heterojunctions; semiconductor-insulator boundaries; Shubnikov-de Haas effect; two-dimensional electron gas; wide band gap semiconductors; zinc compounds

资金

  1. Murata Science Foundation
  2. Asahi Glass Foundation

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A top-gate field-effect device with atomic-layer-deposited Al(2)O(3) dielectric was fabricated to investigate magnetotransport properties of two-dimensional electron gas (2DEG) at a semi-insulating ZnO-Mg(0.12)Zn(0.88)O double heterostructure grown by laser molecular-beam epitaxy. Hall mobility monotonically increased as the density of accumulated electrons increased. The highest mobility at 2 K was recorded to be 5000 cm(2) V(-1) s(-1) at a 2DEG density of 1.2x10(12) cm(-2), which is comparable to the previously reported value for a metallic ZnO/Mg(0.2)Zn(0.8)O heterostructure. Insulator-to-metal transition was observed at a critical density of 6x10(11) cm(-2). The metallic-state channel exhibited Shubnikov-de Haas oscillations, demonstrating an electric-field tunable quantum device based on transparent oxide semiconductor.

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