The electrical conduction behavior of carbon nanowalls (CNWs) has been evaluated by Hall measurement. CNWs, which comprise stacks of graphene sheets standing on the substrate, are fabricated by fluorocarbon/hydrogen plasma enhanced chemical vapor deposition. We have investigated the effect of N-2 addition to C2F6/H-2 system on the electrical properties of CNWs. The CNWs grown with the C2F6/H-2 plasma exhibit p-type conduction. As a result of the nitrogen inclusion in the CNWs, the conduction type of the CNWs changes to n type. The carrier concentration is controllable by changing the flow rate of the additional N-2 during the CNW growth process. (c) 2008 American Institute of Physics.
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