期刊
APPLIED PHYSICS LETTERS
卷 93, 期 11, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.2985898
关键词
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资金
- National Science Foundation (NSF)
- Nanoscale Science and Engineering Center [DMI-0327077]
- Air Force Office of Scientific Research (AFOSR)
- Multidisciplinary University Research Initiative (MURI) [FA9550-04-1-0434]
- Div Of Civil, Mechanical, & Manufact Inn
- Directorate For Engineering [0751621] Funding Source: National Science Foundation
We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. (C) 2008 American Institute of Physics.
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