4.6 Article

Intermixing and chemical structure at the interface between n-GaN and V-based contacts

期刊

APPLIED PHYSICS LETTERS
卷 93, 期 17, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.2992199

关键词

-

资金

  1. U.S. Department of Energy (DOE) [DE-FG36-05GO85032]
  2. Nevada System of Higher Education [NSHE 07-101, 08-03]
  3. DOE [DE-AC02-05CH11231]
  4. Deutsche Forschungsgemeinschaft

向作者/读者索取更多资源

The interface between n-type GaN and V-based contacts was characterized by soft x-ray spectroscopy. We have investigated the chemical interface structure before and after a rapid thermal annealing (RTA) step, which is crucial for the formation of an Ohmic contact. X-ray photoelectron and x-ray excited Auger electron spectra suggest that RTA induces an accumulation of metallic Ga at the surface. Using x-ray emission spectroscopy, we find that the probed nitrogen atoms are in a VN-like environment, indicating that vanadium interacts with nitrogen atoms from the GaN to form VN. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.2992199]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据