相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Manufacturable processes for ≤ 32-nm-node CMOS enhancement by synchronous optimization. of strain-engineered channel and external parasitic resistances
Atif M. Noori et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2008)
Determining the stress tensor in strained semiconductor structures by using polarized micro-Raman spectroscopy in oblique backscattering configuration
Razvigor Ossikovski et al.
JOURNAL OF APPLIED PHYSICS (2008)
Comparative investigation of InGaN quantum well laser diode structures grown on freestanding GaN and sapphire substrates
J. S. Hwang et al.
JOURNAL OF APPLIED PHYSICS (2007)
High resolution mapping of strains and rotations using electron backscatter diffraction
A. J. Wilkinson et al.
MATERIALS SCIENCE AND TECHNOLOGY (2006)
Raman spectral imaging -: A nondestructive, high resolution analysis technique for local stress measurements in silicon
U. Schmidt et al.
VIBRATIONAL SPECTROSCOPY (2006)
High-resolution elastic strain measurement from electron backscatter diffraction patterns: New levels of sensitivity
AJ Wilkinson et al.
ULTRAMICROSCOPY (2006)
Strength and sharp contact fracture of silicon
RF Cook
JOURNAL OF MATERIALS SCIENCE (2006)
Combining high resolution and tensorial analysis in Raman stress measurements of silicon
E Bonera et al.
JOURNAL OF APPLIED PHYSICS (2003)
Strain determination in silicon microstructures by combined convergent beam electron diffraction, process simulation, and micro-Raman spectroscopy
V Senez et al.
JOURNAL OF APPLIED PHYSICS (2003)
Micro-raman measurement of bending stresses in micromachined silicon flexures
VI Srikar et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2003)
分享论文
