4.6 Article

Enhanced absorption by nanostructured silicon

期刊

APPLIED PHYSICS LETTERS
卷 93, 期 19, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3021480

关键词

elemental semiconductors; energy gap; infrared spectra; nanostructured materials; semiconductor thin films; silicon

资金

  1. ANR through the financial supports of the Institut Carnot of LETI
  2. EU through the IP Molecular Imaging [LSHG-CT-2003-503259]

向作者/读者索取更多资源

Some applications such as ultrafast detectors or high efficiency photovoltaics require absorption by thin films. However, close to the bandgap, silicon absorbs very poorly. In this letter, we show that the absorption of a 100 nm slab can be as high as 50% in the range of wavelengths 700-830 nm when using a periodic structure properly designed.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据