4.6 Article

An investigation into the melting of silicon nanoclusters using molecular dynamics simulations

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NANOTECHNOLOGY
卷 16, 期 2, 页码 250-256

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IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/16/2/012

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Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T-m,T-N = T-M,T-Bulk - alphaN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T-m,T-Bulk = 1821 K to a value of T-m,T-357 = 1380 K at the lower limit of the intermediate nanocrystal regime.

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