4.2 Article Proceedings Paper

Application of metal cluster complex ion beam for low damage sputtering

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SURFACE AND INTERFACE ANALYSIS
卷 37, 期 2, 页码 164-166

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JOHN WILEY & SONS LTD
DOI: 10.1002/sia.1955

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cluster ion bean; metal cluster complex; low damage sputtering

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Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet. Copyright (C) 2005 John Wiley Sons, Ltd.

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