Fabrication of FeSi2 nano- and microdot array was performed by utilizing droplet ejection through nanosecond laser-induced forward transfer (ns-LIFT). An amorphous FeSi2 source film on a transparent support was illuminated from the support by a nanosecond excimer laser pulse patterned into migcrogrid form, resulting in size- and site-controlled deposition of microdot array onto a silicon substrate. Micro-Raman spectroscopy confirmed beta-FeSi2 crystalline phase even on unheated substrates. Moreover, the dot size was successfully reduced to approximately 500 nm in diameter, smaller than any previously reported by ns-LIFT. This technique is useful for integrating functional nano- and microdots under atmospheric room -temperature conditions. (c) 2008 The Japan Society of Applied Physics.
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