期刊
APPLIED PHYSICS EXPRESS
卷 1, 期 11, 页码 -出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/APEX.1.115001
关键词
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资金
- New Energy mid Industrial Technology Development Organization (NEDO)
- Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, Elements Science and Technology Project
- Grant-in-Aid for Young, Scientist [(13) 19760475]
We present a low-temperature (similar to 300 degrees C) process for preparing transparent conducting anatase Nb-doped TiO2 (TNO) polycrystalline films by sputtering. We first deposited amorphous films composed of an oxygen-rich bottom layer and oxygen-deficient top layer at room temperature. These films were then crystallized in a reducing atmosphere. The oxygen-rich bottom layer behaved as a seed layer during crystallization of the top layer, resulting in significant improvement of crystallinity and reduction of crystallization temperature. We obtained TNO polycrystalline films showing a resistivity of 6.4 x 10(-4) Omega cm and absorption below 10% in the visible region by post-deposition annealing at 400 degrees C. The developed low-temperature process was applied to fabricating TNO films on plastics and glass with low glass-transition temperature. (C) 2008 The Japan Society of Applied Physics
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