Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin

Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally cut-able monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 degreesC) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area. (C) 2004 Elsevier B.V. All rights reserved.