Patterned porous silicon formed with photolithography

Porous silicon is a fascinating light-emitting material among silicon-related materials. We have challenged to form a patterned porous silicon layer for the purpose of the micro optical devices with the help of photolithography. Photoresist has been used as a mask that prevented the formation of porous silicon. We achieved square patterned porous silicon with a precision of 30 mu m. We also found a problem that the formation of porous silicon also proceeded under the mask partly. (C) 2005 Springer Science + Business Media, Inc.