期刊
MATERIALS TODAY
卷 8, 期 2, 页码 34-42出版社
ELSEVIER SCI LTD
DOI: 10.1016/S1369-7021(05)00700-5
关键词
-
资金
- DARPA [N66001-02-C-8011, N66001-01-1-8964]
- Advanced Technology Program of National Institute of Standards and Technology
The escalating cost of next generation lithography (NGL) is driven in part by the need for complex sources and optics. The cost for a single NGL tool could soon exceed $50 million, a prohibitive amount for many companies. As a result, several research groups are looking at alternative, low-cost methods for printing sub-100 nm features. Many of these methods are limited in their ability to do precise overlay. In 1999, Willson and Sreenivasan developed step and flash imprint lithography (S-FIL (TM)). The use of a quartz template opens up the potential for optical alignment of the wafer and template. This paper reviews several key aspects of the S-FIL process, including template, tool, ultraviolet (UV)-curable monomer, and pattern transfer. Two applications are also presented: contact holes and surface acoustic wave (SAW) filters.
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