期刊
MATERIALS TODAY
卷 8, 期 2, 页码 18-24出版社
ELSEVIER SCI LTD
DOI: 10.1016/S1369-7021(05)00698-X
关键词
-
资金
- Advanced Lithography Program of the Defense Advanced Research Projects Agency [F19628-00-C0002]
- MIT Lincoln Laboratory
- SEMATECH
Projection optical lithography has had a remarkable history and, most probably, it will have an equally successful future for at least another decade. To date, it has met all the major challenges posed by the semiconductor industry roadmap. In order to do so, it has undergone important transformations, and has greatly expanded the frontiers of the science and engineering of optics. This paper will review the most recent developments, including transitioning to the short wavelengths of 193 nm and 157 nm, moving toward ultrahigh numerical apertures facilitated by liquid immersion, and incorporation of a range of resolution-enhancing techniques such as optical proximity correction and phase-shifting masks.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据