期刊
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
卷 115, 期 3, 页码 1069-1072出版社
SPRINGER
DOI: 10.1007/s00339-013-7947-1
关键词
-
资金
- University of Malaya through the UMRG programme [RP013D-13AET]
- PRPUM [CG022-2013]
To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 C-degrees. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700-900 C-degrees.
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