The physics and phenomenology of one atmosphere uniform glow discharge plasma (OAUGDP™) reactors for surface treatment applications

In this paper, we present data on the physics and phenomenology of plasma reactors based on the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP (TM)) that are useful in optimizing the conditions for plasma formation, uniformity and surface treatment applications. It is shown that the real (as opposed to reactive) power delivered to a reactor is divided between dielectric heating of the insulating material and power delivered to the plasma available for ionization and active species production. A relationship is given for the dielectric heating power input as a function of the frequency and voltage at which the OAUGDP (TM) discharge is operated.