Vertical growth of carbon nanowalls using rf plasma-enhanced chemical vapor deposition

Two-dimensional carbon nanostructures (carbon nanowalls) were fabricated by capacitively coupled, radio-frequency (rf) plasma-enhanced chemical vapor deposition (PECVD) employing fluorocarbon/hydrogen (H) mixtures. Correlation between carbon nanowall growth and fabrication conditions, such as the carbon source gases, was investigated. In addition, H atom density in the plasma was measured using vacuum ultraviolet absorption spectroscopy (VUVAS), in order to discuss the growth mechanism of carbon nanowalls. (c) 2004 Elsevier B.V. All rights reserved.