期刊
REVIEWS OF MODERN PHYSICS
卷 77, 期 2, 页码 489-511出版社
AMER PHYSICAL SOC
DOI: 10.1103/RevModPhys.77.489
关键词
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The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the cause and effect approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed.
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