4.5 Article

A novel method for the fabrication of high-aspect ratio C-MEMS structures

期刊

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
卷 14, 期 2, 页码 348-358

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JMEMS.2004.839312

关键词

complex microelectromechanical systems (C-MEMS); high-aspect ratio; Li intercalation; microbattery; photoresist; pyrolysis; suspended structure

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A novel fabrication process was developed to create high aspect ratio (> 10 : 1) carbon posts, all-carbon suspended bridges and wires, self-organized bunches of carbon posts, and carbon plates supported by carbon beams. The structures are all made from a two-step pyrolysis process with SU-8 photoresist as the starting material. In this paper we describe the fabrication of these various new C-MEMS structures and detail an important application of the high aspect ratio carbon posts arrays. The carbon post arrays can be reversible charged/discharged with Li ions, an application that may greatly impact the application of C-MEMS in three-dimensional microbatteries. Complex suspended C-MEMS structures, such as wires, plates, ribbons, and self-organized bunches of posts, were built. Methods to accurately and repeatedly fabricate all the above 3-D C-MEMS structures are given.

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