期刊
IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 33, 期 2, 页码 346-347出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2005.845022
关键词
magnetron sputtering; plasma density; pulsed plasmas; thin film deposition
The spatial electron density distribution was measured as function of time in a high-power pulsed magnetron discharge. A Langmuir probe was positioned in various positions below the target and the electron density was mapped out. We recorded peak electron densities exceeding 10(19) m(-3) in a close vicinity of the target. The dynamics of the discharge showed a dense plasma expanding from the race-track axially into the vacuum chamber. We also record electrons trapped in a magnetic bottle where the magnetron magnetic field is zero, formed due to the unbalanced magnetron.
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