4.3 Article

Microwave plasma system for material processing

期刊

IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 33, 期 2, 页码 340-341

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2005.845005

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cavity resonator; ceramics; frequency; material processing; microwave plasma

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The microwave plasma system operates at various ranges of frequencies including 0.896, 2.45, and 10 GHz, and uses a waveguide-based applicator to generate a microwave plasma jet (MPJ) at atmospheric pressure. The plasma is formed outside the cavity due to the strong electric field, generated by the microwave power, which occurs between the gas nozzle and an aperture in the applicator. The MPJ system has produced plasmas using a variety of gases and gas mixtures, including argon, helium, oxygen, and nitrogen. The MPJ has been used successfully for various materials processing including welding, cutting, and production of fibers from high-melting temperature materials, such as ceramic.

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