期刊
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 5, 期 5, 页码 723-728出版社
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2005.092
关键词
thin films; physical vapor deposition; porous materials; periodic structures; electron beam lithography; laser direct write lithography; microfluidics; photonic band gap crystals; waveguide
We present a new method for making functional patterns in thin films consisting of highly ordered arrays of complex, submicrometer structures, deposited at oblique flux incidence angles using the glancing angle deposition technique. By performing physical vapor deposition on direct write seed layers with intentional point and line lattice defects, we are able to generate embedded air-filled linear and planar patterns in the films in a single-step transfer approach with no need for conventional postdeposition micromachining. The uniformity and porosity of the thin films is fully maintained, with minimal impact on the film morphology adjacent to the patterns. This ability to engineer air-filled patterns is crucial to several promising thin-film applications, including photonic band gap crystals and microfluidics.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据