期刊
ACTA MATERIALIA
卷 53, 期 8, 页码 2431-2437出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2005.02.005
关键词
X-ray diffraction; silicides; thermal expansion
The coefficients of thermal expansion (CTEs) and atomic site occupation factors were measured for the pseudo-binary molybdenurn-vanadium silicide Mo5Si3 V5Si3. The ratios of the CTEs in the crystallographic c and a directions range from 2.0 for Mo5Si3 to 1.2 for Mo2V3Si3. The metal atoms can occupy chain sites (in the crystallographic c-direction), and non-chain sites. The relatively small V atoms prefer the chain sites in Mo5Si3, Whereas the relatively large Mo atoms prefer the non-chain sites in V5Si3. These site occupation characteristics reduce the thermal expansion in the c-direction and thereby the CTE anisotropy. Ab initio calculations for Mo4VSi3 suggest that, energetically, V prefers the chain sites, while the measurements show that V occupies also non-chain sites. Extrapolation of the experimental results assuming the site-occupation used in the calculations agrees with the theoretical result that the thermal expansion Of Mo4VSi3 is isotropic. (c) 2005 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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