期刊
REVIEW OF SCIENTIFIC INSTRUMENTS
卷 76, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.1896225
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The lifetime of multilayer mirrors is an outstanding problem on the road to commercialization of extreme-ultraviolet (EUV) lithography. The mirrors are exposed to high-intensity EUV radiation in a vacuum with traces of water vapor and hydrocarbons. The combination of EUV and reactive species leads to chemical degradation of the mirror surfaces-carbon deposition and/or oxidation of the Si surface. In order to understand and quantify these processes, as well as to study mitigation schemes, we have constructed a dedicated synchrotron-based facility with the capability to deliver high-intensity EUV radiation in a variety of trace-gas atmospheres. The facility features a spherical Mo-Si coated mirror and a thin Be foil captured in a gate valve, which serves as both a spectral filter and vacuum seal. We will describe this facility and its performance.
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