4.4 Article Proceedings Paper

High-power 1.3 μm InAs/GaInAs/GaAs QD lasers grown in a multiwafer MBE production system

期刊

JOURNAL OF CRYSTAL GROWTH
卷 278, 期 1-4, 页码 335-341

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2005.01.040

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low-dimensional structures; molecular beam epitaxy; semiconducting III-V materials; laser diodes

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High-performance (high optical output power, high efficiency), GaAs-based Quantum Dots (QD) 1.3 mu m edge emitting laser (EEL) results are presented. The active region is based on multiple stacks of InAs/GaInAs/GaAs QD. The whole structure has been grown in a multiwafer production MBE system (using 5 x 3 substrate holders). Threshold current density of 190A/cm(2) and high differential quantum efficiency of 70% were obtained at room temperature. These excellent values in addition to good I-V characteristics (1.1 V turn on voltage and series resistance as low as 2 x 10(-4) Omega cm(2)) led to record continuous wave (CW) output power of 4.2 W for broad area devices (100 mu m wide, 1600 mu m long). (c) 2005 Elsevier B.V. All rights reserved.

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