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Characterization of density profile of laser-produced Sn plasma for 13.5 nm extreme ultraviolet source

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APPLIED PHYSICS LETTERS
卷 86, 期 20, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.1931825

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We investigated the electron density profile corresponding to the dominant extreme ultraviolet (EUV) emission from a laser-produced Sn plasma using a combination of a green and an UV interferometer. A comparison between experimental results and a one-dimensional radiation hydrodynamic simulation shows reasonable agreement, and the discrepancy could be attributed to three-dimensional plasma expansion. It was found that, due to opacity effects, most of the EUV light comes from an under-dense plasma region. (c) 2005 American Institute of Physics.

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