Neodymium oxide and neodymium aluminate thin films by atomic layer deposition

Nd2O3 and NdAlO3 thin films were deposited onto Si(100) and soda lime glass by atomic layer deposition using Nd(thd)(3), O-3, (CH3)(3)Al and H2O as precursors at 200-450 degrees C. Films were analyzed by X-ray diffraction, Fourier transform infrared spectroscopy, atomic force microscopy, X-ray fluorescence spectroscopy and time-of-flight elastic recoil detection analysis. Cubic (100) oriented Nd2O3 films with a relative permittivity of 10.5 were obtained at 290-325 degrees C. The carbon content of the films deposited at low temperatures was high but decreased with increasing temperature and could be further reduced by annealing at 650-700 degrees C. Nd2O3 films with low carbon content were somewhat unstable and became hydrated upon storage in the ambient. NdAlO3 films deposited at 300 degrees C were amorphous but crystallized during annealing in nitrogen or oxygen at 850-900 degrees C. (c) 2004 Elsevier B.V. All rights reserved.