期刊
IEEE PHOTONICS TECHNOLOGY LETTERS
卷 17, 期 6, 页码 1139-1141出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2005.846948
关键词
epitaxial growth; quantum dots (QDs); semiconductor diodes; semiconductor lasers
The combination of high-growth-temperature GaAs spacer layers and high-reflectivity (HR)-coated facets has been utilized to obtain low threshold currents and threshold current densities for 1.3-mu m multilayer InAs-GaAs quantum-dot lasers. A very low continuous-wave (CW) room-temperature threshold current of 1.5 mA and a threshold current density of 18.8 A/cm(2) are achieved for a three-layer device with a 1-mm HR/HR cavity. For a 2-mm cavity, the CW threshold current density is as low as 17 A/cm(2) for an HR/HR device. An output power as high as 100 mW is obtained for a device with HR/cleaved facets.
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