期刊
OPTICS EXPRESS
卷 13, 期 13, 页码 4922-4930出版社
OPTICAL SOC AMER
DOI: 10.1364/OPEX.13.004922
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We numerically demonstrate a metamaterial with both negative e and negative mu over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques. (C) 2005 Optical Society of America
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