Miniaturized multipurpose cell for in situ investigation of sputtered thin films with x-ray techniques -: art. no. 073905

The design of a miniaturized sputter deposition chamber for the in situ study of thin film growth processes with x rays is reported. X-ray diffraction experiments, grazing incidence x-ray reflectometry, as well as x-ray fluorescence analysis are possible. Due to its compact design and low weight, the chamber can be used in conjunction with conventional x-ray reflectometers and laboratory x-ray diffractometers as well, i.e., very detailed in situ studies of reactive and nonreactive sputtering processes and the resulting film properties are possible. The construction of the chamber is described in detail and first results obtained in situ with different techniques are presented, indicating that experiments that were previously restricted to synchrotron radiation facilities are now possible even with laboratory equipment. (c) 2005 American Institute of Physics.