期刊
APPLIED SURFACE SCIENCE
卷 248, 期 1-4, 页码 276-280出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2005.03.050
关键词
laser-induced plasma-assisted ablation (LIPAA); femtosecond laser; double-pulse irradiation
Double-pulse irradiation using a near-IR femtosecond laser (lambda = 775 nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distances was investigated. The first pulse generates the laser-induced plasma from the metal target, but does not induce ablation of the glass substrate. The second pulse induces the high-efficiency ablation of the substrate, delayed by several nanoseconds (ns). A possible mechanism of the conventional LIPAA process using a ns pulsed laser is discussed based on the obtained results. (c) 2005 Elsevier B.V. All fights reserved.
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