Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution

The paper presents a solution for improving the quality of the surface generated during deep wet etching of glass using an HF (49%)/HCl (37%) solution in a volumetric ratio 10:1. Pyrex glass (Coming 7740) and soda lime glass were analyzed. In addition, the characterization of the main masking layers, including photoresist, amorphous silicon, polysilicon and Cr/Au for deep wet etching in the optimal solution, is described. Published by Elsevier B.V.