期刊
ANALYTICAL AND BIOANALYTICAL CHEMISTRY
卷 382, 期 8, 页码 1791-1799出版社
SPRINGER HEIDELBERG
DOI: 10.1007/s00216-005-3365-3
关键词
ion-beam techniques; atomic layer deposition; thin films; electroluminescent displays; high-k insulators
This review introduces the possibilities of ionbeam techniques for the analysis of thin films and thin film structures processed by atomic layer deposition (ALD). The characteristic features of ALD are also presented. The analytical techniques discussed include RBS, NRA and ERDA with its variants, viz. the TOFERDA and HI-ERDA. The thin film examples are taken from flat-panel display technology (TFEL structures) and the semiconductor industry (high-k insulators).
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据