期刊
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
卷 20, 期 8, 页码 870-875出版社
IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/20/8/043
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Electrical and optical properties of low-temperature, plasma enhanced chemical vapour deposited films of TiO2 have been studied; the source gases were TiCl4 and O-2. The amorphous, as-deposited films had a dielectric constant similar to 33 consistent with their measured density of 3.2 +/- 0.2 g cm(-3). Films deposited using a -41 V substrate bias contained the anatase phase and some rutile as evidenced from infrared spectroscopy and x-ray scattering. Annealing of these films at 600 degrees C resulted in a significant increase in the rutile content of the film.
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