4.7 Article

Printing methods and materials for large-area electronic devices

期刊

PROCEEDINGS OF THE IEEE
卷 93, 期 8, 页码 1491-1499

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPROC.2005.851492

关键词

amorphous silicon; flat-panel display; polymer semiconductors; thin-film transistor

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Two digital printing methods for the fabrication of active matrix thin-film transistor (AM-TFT) backplanes for displays are described. A process using printed resists layers, referred to as digital lithography was used to fabricate arrays of hydrogenated amorphous silicon TFTs. TFTs were also fabricated using a combination. on of digital lithography to pattern metals and inkjet printing to pattern and deposit a polymeric semiconducting layer The relative performance of amorphous silicon and polymer TFTs were evaluated. The utility of digital lithographic processing was demonstrated by the fabrication of prototype reflective displays using electrophoretic media.

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