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Interstitial H2 in germanium by Raman scattering and ab initio calculations -: art. no. 153201

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PHYSICAL REVIEW B
卷 72, 期 15, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.72.153201

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Single-crystalline germanium wafers exposed to hydrogen and/or deuterium plasma are studied by means of Raman scattering. The Raman frequencies are compared to results of ab initio calculations. For samples treated with pure hydrogen, Raman measurements performed at a temperature of 80 K reveal two sharp lines at 3826 and 3834 cm(-1) with an intensity ratio of 3:1, which are assigned to ortho- and para-H-2 trapped at the interstitial T site of the lattice.

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