期刊
SURFACE & COATINGS TECHNOLOGY
卷 200, 期 1-4, 页码 254-257出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2005.02.015
关键词
work function; ion implantation; plasma torches
As part of the studies of new materials to be used as electrodes for plasma torches, polycrystalline copper thin film substrates, obtained by depositing copper on silicon wafer using the Electron Beam technique, were implanted with low energy (20-50 keV) alkali ions. The samples, before and after implantation process, were analysed in terms of surface composition and work function changes. Although the implantation doses were low (3 x 10(15) ions/cm(2)), relatively high concentrations of alkali metals were detected on the surface, which yielded a work function decrease of 3-9% in relation to the copper value. (c) 2005 Elsevier B.V. All rights reserved.
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