期刊
出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nima.2005.07.064
关键词
X-ray diffraction; X-ray topography; textured grain
We introduce a new X-ray diffraction microscopy technique capable of coupling grain orientation with its spatial location in textured thin-films. The principle is based on the combination of X-ray topography with diffractometry. High-resolution X-ray diffractometry using a scintillation detector is utilized to measure orientational distribution of individual grains. Then X-ray topography using CCD system is applied to determine the spatial locations of the angularly resolved grains. The successful application is demonstrated for grain-on-grain epitaxial alignment between the film and the substrate in Y2O3/Ni. The feasibility and the limitations of the technique are discussed. (c) 2005 Elsevier B.V. All rights reserved.
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