Controlled growth of well-aligned ZnO nanorod array using a novel solution method

A simple method of synthesizing nanomaterials and the ability to control the size and position of them are crucial for fabricating nanodevices. In this work, we developed a novel ammonia aqueous solution method for growing well-aligned ZnO nanorod arrays on a silicon substrate. For ZnO nanorod growth, a thin zinc metal seed layer was deposited on a silicon substrate by thermal evaporation. Uniform ZnO nanorods were grown on the zinc-coated silicon substrate in aqueous solution containing zinc nitrate and ammonia water. The growth temperature was as low as 60-90 degrees C and a 4-in. wafer size scale up was possible. The morphology of a zinc metal seed layer, pH, growth temperature, and concentration of zinc salt in aqueous solution were important parameters to determine growth characteristics such as average diameters and lengths of ZnO nanorods. We could demonstrate the discrete controlled urowth of ZnO nanorods using sequential, tailored growth steps. By combining our novel solution method and general photolithography, we selectively grew ZnO nanorod arrays on a patterned silicon substrate. Our concepts on controlled ZnO nanorod growth using a simple solution method would be applicable for various nanodevice fabrications.