期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
卷 23, 期 6, 页码 1588-1591出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.2049301
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The origin of threading dislocations (TDs) in GaN epitaxial layers grown on sapphire (0001) substrate is investigated using moire fringes from plan-view transmission electron microscopy. The studied samples are nucleation layers deposited at 560 degrees C for times ranging from 20 s to 180 s. This initial stage growth gives rise to islands which are randomly rotated and relaxed with misfit dislocations. The islands that start to coalesce from 60 s growth time keep this random orientation and this leads to the bending of 60 degrees misfit dislocations in the interface plane to form a-type TDs inside low angle boundaries. (c) 2005 American Vacuum Society.
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