The annealing behavior of the free-carrier absorption, O-H vibrational absorption, and photoluminescence lines previously associated with H-related donors in ZnO has been studied. One set of H-related defects gives rise to O-H local vibrational mode absorption at either 3326 or 3611 cm(-1), with the relative intensities of these lines depending on the source of the ZnO starting material. These O-H lines anneal away together at 150 degrees C along with similar to 80% of the free carriers introduced by H. The common annealing behavior of the O-H ir lines suggests that they are closely related. An additional defect produced by hydrogenation is thermally stable up to an annealing temperature of 500 degrees C where a bound-exciton photoluminescence line often associated with H in ZnO is also annealed away. This more thermally stable donor accounts for similar to 20% of the free carriers introduced by H. These experiments on H in ZnO reveal a complex behavior with several defects being introduced and with properties that depend strongly on the source of the ZnO starting material.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据