期刊
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
卷 15, 期 12, 页码 2456-2460出版社
IOP PUBLISHING LTD
DOI: 10.1088/0960-1317/15/12/030
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We demonstrate gray scale electron beam lithography on a functionalized SU-8 resist for fabrication of single mode solid state dye laser devices. The resist is doped with Rhodamine 6G perchlorate and the lasers are based on a first-order Bragg grating distributed feedback resonator. The lasers are optically pumped at 532 nm, and exhibit low lasing threshold from 530 nJ mm(-2) and single mode output at selectable wavelengths from 580 to 630 nm, determined by the grating pitch. The lasers are well suited for integration into polymer based lab-on-chip circuits for interference based sensing.
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