期刊
APPLIED PHYSICS LETTERS
卷 87, 期 25, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.2142084
关键词
-
资金
- Direct For Mathematical & Physical Scien
- Division Of Chemistry [0827634] Funding Source: National Science Foundation
A wet chemical preparation involving de-ionized water, hydrogen peroxide, and hydrofluoric acid is used to passivate germanium (Ge) (100) surfaces. Infrared absorption spectroscopy and x-ray photoemission spectroscopy studies show that oxide free and hydrogen-terminated Ge (100) surfaces can be obtained. As in the case for silicon (100) surfaces etched in hydrofluoric acid, hydrogen-terminated Ge (100) surfaces are atomically rough, with primarily mono- and dihydride terminations. (c) 2005 American Institute of Physics.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据